Ceramics-Silikáty 55, (1) 64 - 67 (2011) |
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DIFFUSION AT THE INTERFACE BETWEEN Ag DOPED SiO₂ LAYERS AND THE GLASS SUBSTRATE
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Novotný Marek 1, Matoušek Josef 2
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1 AGC Flat Glass Europe, Jumet, Rue de l’Aurore 2, Belgium
2 Department of Glass and Ceramics ,
Institute of Chemical Technology Prague, Technická 5, 166 28 Prague, Czech Republic
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Keywords: Silica layers, Sol-gel, Silver, Glass substrate
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Silica layers containing silver were prepared by the sol-gel method and deposited on the Float glass substrate. Heat treatment
at different temperatures (60 and 550°C) and time periods (1 to 6 hours) followed afterwards. Silica layer texture without
any particles was observed by electron microscopy. Silver, sodium, tin and silicon concentration profiles on “tin” side of
Float glass substrates and in the deposited layers were evaluated by the help of Secondary Neutral Mass Spectrometry and
discussed with respect to diffusion process taking place at the interface of the system substrate-layer. The concentration
profiles of Ag and Na confirmed exchange diffusion mechanism at 550°C by which silver moves quickly from the surface
layer into glass substrate. |
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