ISSN 0862-5468 (Print), ISSN 1804-5847 (online) 

Ceramics-Silikáty 32, (2) 109 - 123 (1988)


THE EFFECT OF FIRING TEMPERATURE ON THE PROPERTIES OF MODEL THICK-FILM RESISTORS

I. Morphology and Microstructure of the Films


 
Kubový Alois, Havlas Ivo
 
Research Institute of Electrotechnical Ceramics, Pospíšilova 281, 500 64 Hradec Králové

On the basis of microscopical examinations and resistivity and Seebeck's coefficient measurements, a model of the development of structure (morphology) of thick-film resistors (TFR) during their firing has been suggested. The model differs from those published so far particularly in that formation of a narrow band of localised impurity states, resulting from diffusion of Ru from the conductive grains, is considered instead of sintering of conductive grains in the last stage of structural development.


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