Ceramics-Silikáty 59, (2) 145 - 148 (2015)

Silica nano-porous thin films at various calcination temperatures were deposited on glass substrates with a layer by layer method. The structure, morphology, surface composition, transmittance and reflectance of the films were investigated by X-ray diffraction, field emission scanning electron microscopy, attenuated total reflectance fourier transform infrared spectroscopy and UV-VIS-NIR spectrophotometer, respectively. The results indicated that the transmittance of the films is increased by increasing the calcinations temperatures to 300°C and at higher temperature, it is decreased. The deposition of silica nano-porous film on the glass at the optimum calcination temperature (300°C) decreased refractive index of the glass at a wavelength of 550 nm from 1.5 to 1.37.